Please use this identifier to cite or link to this item: http://hdl.handle.net/123456789/221
Title: Influence of silicon surface treatment by plasma etching and scratching on the nucleation of diamond grown in HFCVD - a comparative study
Authors: Shafeeque, Ansari
Keywords: Influence of silicon surface treatment by plasma etching and scratching on the nucleation of diamond grown in HFCVD - a comparative study
Issue Date: 2007
URI: http://hdl.handle.net/123456789/221
Appears in Collections:Chemistry



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