Please use this identifier to cite or link to this item: http://hdl.handle.net/123456789/222
Title: Influences of O2 admixture and sputtering pressure on the properties of ITO thin films deposited on PET Substrate using RF reactive magnetron sputtering
Authors: Shafeeque, Ansari
Keywords: Influences of O2 admixture and sputtering pressure on the properties of ITO thin films deposited on PET Substrate using RF reactive magnetron sputtering
Issue Date: 2003
URI: http://hdl.handle.net/123456789/222
Appears in Collections:Chemistry



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