Please use this identifier to cite or link to this item: http://hdl.handle.net/123456789/228
Title: Low temperature deposition and effect of plasma power on tin oxide thin films prepared by modified plasma enhanced chemical vapor deposition
Authors: Shafeeque, Ansari
Keywords: Low temperature deposition and effect of plasma power on tin oxide thin films prepared by modified plasma enhanced chemical vapor deposition
Issue Date: 2007
URI: http://hdl.handle.net/123456789/228
Appears in Collections:Chemistry



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